Sheet, Slah, صلاح, Hazim Mahmoud, and حازم. “Measurement of the Doped Ion Depth of Junction Semiconductor Prepared by Ion Implementation Using ESCA Technique”. Journal of Education and Science (JES) 21, no. 2 (June 1, 2008): 1–6. Accessed August 4, 2025. https://rjps.uomosul.edu.iq/index.php/edusj/article/view/18411.